Colloidal lithography is a nanofabrication technique that utilizes colloidal particles as masks for creating ordered nanostructures on substrates. This cost-effective and scalable method has gained ...

At the heart of advancing semiconductor chip technology lies a critical challenge: creating smaller, more efficient electronic components. This challenge is particularly evident in the field of ...

Gallium nitride (GaN)-based light-emitting diodes (LEDs) have transformed the lighting industry by replacing conventional lighting technologies with superior energy efficiency, longer operating life ...

Computational lithography and mask optimization techniques are at the forefront of enabling the semiconductor industry's continued miniaturisation of integrated circuits. This field encompasses ...

What is Block Copolymer Lithography? Block copolymer lithography is a nanofabrication technique that utilizes the self-assembly properties of block copolymers to create ordered nanostructures. Block ...

Concept of mask/wafer co-optimization by moving the shot with mask and wafer double simulation to minimize wafer error. VSB shot configurations and its corresponding ...

TSMC is planning to adopt double patterning extensively at 20nm, despite the high cost of doing so. Why? Because EUV hasn't come through. Share on Facebook (opens in a new window) Share on X (opens in ...

A technical paper titled “Resistless EUV lithography: photon-induced oxide patterning on silicon” was published by researchers at Paul Scherrer Institute, University College London, ETH Zürich, and ...

As the demand for smaller and more complex devices continues to grow, nanolithography, the process of patterning nanoscale structures on a surface, offers a promising solution for producing precise ...

Why it matters: Canon has shipped the first example of its nanoimprint lithography equipment to an American research consortium, marking a significant milestone in the commercialization of this ...